INSTRUMENTS

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Nanofabrication Facility @ NCSU

 
 
 

 

Secondary Ion Mass Spectrometer (SIMS)   320 MRC
AIF has Cameca IMS 6f SIMS for precise measurment and depth profiling of semiconductor layers. The Cameca has detection limits of PPM and PPB depending on the species being analyzed and the matrix.
       
Cameca 6f
Capabilities
  • O2+,O-,Cs+, Sputtering Sources
  • Analysis of + or - ions
  • SIMS Depth Profiling
  • Mass Spectra
  • Digital Image Acquisition & Processing
Beam Currents
  • <1µA with <2% drift/hr
Mass to Charge Range
  • 1 to 560 amu
Mass Resolution
  • (M/_M) 20,000
Detection Limits
  • B, 7xE12 at/cc
  • P, 3 x1013 at/cc
  • As, 3xE13at/cc
  • H, 2xE16at/cc in Si
Image Resolution
  • Microscope >0.5 µm
  • Microprobe >0.2µm
Vacuum
  • < 1 x E-9 Torr in analysis chamber
Features
  • Normal Incidence Charge Neutralization Electron Gun
  • Sample Rotation Stage for High Resolution Depth Profiling
  • O2 Flood System
  • Cryogenic Sample Stage
  • 2-D and 3-D SIMS Mapping
Specimen Considerations
  • Vacuum Compatible Solid
  • Specimen size 6 mm x 6 mm x 1 mm
  • Conductor, Semiconductor or Insulator
   
       

For more information about the SIMS or to schedule some analysis contact:

Fred Stevie Fred Stevie
Lab Manager, Surface Analysis Lab
318 MRC
919.515.7037 Office
919.515.7659 SIMS Lab
fred_stevie@ncsu.edu