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Surface
Analysis Lab

Cameca
IMS 6f
| Capabilities |
|
O2+,O-,Cs+,
Sputtering Sources
Analysis of + or - ions
SIMS Depth Profiling, Mass Spectra,
Digital Image Acquisition & Processing |
| Beam
Currents |
|
<1µA with <2% drift / hour |
| Mass
to Charge Range |
|
1 to 560 amu |
| Mass
Resolution |
|
(M/_M)
20,000 |
| Detection
Limits |
|
B,
7xE12 at/cc; P, 3 x1013 at/cc; As, 3xE13at/cc; H, 2xE16at/cc
in Si |
| Image
Resolution |
|
Microscope
>0.5 µm; Microprobe >0.2µm |
| Vacuum |
|
<
1 x E-9 Torr in analysis chamber |
| Features |
|
Normal
Incidence Charge Neutralization Electron Gun
Sample Rotation Stage for High Resolution Depth Profiling
O2 Flood System
Cryogenic Sample Stage
2-D and 3-D SIMS Mapping |
| Specimen
Considerations |
|
Vacuum
Compatible Solid
Specimen size 6 mm x 6 mm x 1 mm
Conductor, Semiconductor or Insulator |
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Last updated
January 22, 2008
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