Multidisciplinary
University
Research
Initiative
1994 MURI RESEARCH CENTERS IN INTELLIGENT DESIGN AND MANUFACTURING IN ELECTRONICS AND MATERIALS PROCESSING
Modeling and Control of Advanced Chemical Vapor Deposition Processes:
The Control of Defects in Mixed III-V Compound Heterostructures
OBJECTIVES:
Our overall efforts are to design an efficient rapid thermal OMCVD reactor system, including efforts to study the initial phases for heteroepitaxial growth of GaP/Ga(x)IN(1-x)P heterostructures on silicon substrates. The approach involves a combination of remote plasma-assisted nitridation, as the processing approach, and PRS, as the real-time monitoring approach. Other topics include development of real-time measurement techniques, models for nonlinear deposition in a RTOMCVD reactor, and computational methods in support of design of reactor and real time feed back control.
MEMBERS:
Faculty:
K.J. Bachmann
H.T. Banks
N. Dietz
K. Ito
M.J. Kushner
G. Lucovsky
S. Mahajan
J.S. Scroggs
H.T. Tran
Research Associates:
Istvan Lauko
Fuchao Wang
Graduate Students:
Stacie LeSure
Sonya McCall
Vijay Narayanan
Vincent Woods
PUBLICATIONS: